000			00331nmm a2200133Ia 4500
008			160408s9999||||xx |||||||||||||||||und||
020			_a9781437778595
041			_aEnglish
100			_aDoi, Y.
245			_aAdvances in CMP Polishing Technologies
260			_bWilliam Andrew
650			_aEngineering 2011 (2012)
942			_cEB
999			_c24625 _d24625