| 000 | 00648nam a22001937a 4500 | ||
|---|---|---|---|
| 005 | 20161017124054.0 | ||
| 008 | 161017b xxu||||| |||| 00| 0 eng d | ||
| 040 | _aCentral Library-NITS | ||
| 041 | _aEnglish | ||
| 082 |
_a620 _bNAT |
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| 100 | _aNath, Madhuchhanda | ||
| 245 |
_aStudies of high-K thin films for gate dielectric application in metal-oxide-semiconductor devices _cby Madhuchhanda Nath |
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| 260 |
_aSilchar _c2016 |
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| 300 |
_axxiii, 145p. _c29 cm |
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| 502 |
_aGuided by Dr. Asim Roy & Dr. Avijit Chowdhury, _bPhD Thesis, _cNIT Silchar _d2016 |
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| 650 | _aPhysics | ||
| 650 | _aMetal-Oxide-Semiconductor Devices | ||
| 942 | _cTH | ||
| 999 |
_c24884 _d24884 |
||