Studies of high-K thin films for gate dielectric application in metal-oxide-semiconductor devices (Record no. 24884)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 00648nam a22001937a 4500 |
| 005 - DATE & TIME | |
| control field | 20161017124054.0 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 161017b xxu||||| |||| 00| 0 eng d |
| 040 ## - University/Facalty | |
| Original cataloging agency | Central Library-NITS |
| 041 ## - Language | |
| Language | English |
| 082 ## - DDC NUMBER | |
| Classification number | 620 |
| Book Number | NAT |
| 100 ## - Personal Name | |
| Personal name | Nath, Madhuchhanda |
| 245 ## - TITLE STATEMENT | |
| Title | Studies of high-K thin films for gate dielectric application in metal-oxide-semiconductor devices |
| Statement of Resposibility | by Madhuchhanda Nath |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT) | |
| Place of publication, distribution, etc | Silchar |
| Date of publication, distribution, etc | 2016 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Collation | xxiii, 145p. |
| Dimension | 29 cm |
| 502 ## - Dissertation Note | |
| Dissertation Note | Guided by Dr. Asim Roy & Dr. Avijit Chowdhury, |
| Degree Type | PhD Thesis, |
| Name of granting institution | NIT Silchar |
| Year Degree Granted | 2016 |
| 650 ## - Subject | |
| Subject | Physics |
| 650 ## - Subject | |
| Subject | Metal-Oxide-Semiconductor Devices |
| 942 ## - ADDED ENTRY ELEMENTS (KOHA) | |
| Koha item type | Thesis |
| Withdrawn status | Lost status | Source of classification or shelving scheme | Damaged status | Not for loan | Koha collection | Location (home branch) | Sublocation or collection (holding branch) | Shelving location | Date acquired | Koha issues (times borrowed) | Koha full call number | Barcode (Accession No.) | Koha date last seen | Price effective from | Koha item type |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Dewey Decimal Classification | Reference | National Institute of Technology, Silchar | National Institute of Technology, Silchar | Reference | 10/17/2016 | 620 NAT | TH82 | 10/17/2016 | 10/17/2016 | Thesis |
