Studies of high-K thin films for gate dielectric application in metal-oxide-semiconductor devices by Madhuchhanda Nath

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TextLanguage: English Publication details: Silchar 2016Description: xxiii, 145p. 29 cmSubject(s):

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Dissertation note: Guided by Dr. Asim Roy & Dr. Avijit Chowdhury, PhD Thesis, NIT Silchar 2016

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Item type	Current library	Collection	Call number	Status	Date due	Barcode
Thesis	National Institute of Technology, Silchar Reference	Reference	620 NAT (Browse shelf(Opens below))	Available		TH82

Guided by Dr. Asim Roy & Dr. Avijit Chowdhury, PhD Thesis, NIT Silchar 2016

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